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安达加硬润滑MOS2真空镀膜

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性能优势

· Coating deposition carried out using a high density of low energy bombarding ions.

使用高密度低能量轰击离子进行沉积镀膜。

· Deposition of very dense, non-columnar coating structures with low internal stresses.

镀层致密度好,低柱状晶结构,内应力低

· Deposition of coatings with dense structures at low temperatures.

可在低温环境下沉积致密结构的镀层

· High efficiency of ion cleaning resulting in coatings with the highest levels of adhesion.

**率等离子清理以提供高的镀层结合强度。

· Coatings quality is assured by the use of specially designed Plasmag sputter sources, which create an intense plasma and high ion bombardment of work pieces.

镀层品质保证是由使用专门设计plasmag溅射源及提供高密度的等离子。   

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比尔安达(上海)润滑材料有限公司 > 铝产品 > 安达加硬润滑MOS2真空镀膜
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